Investigation into the Characteristics of Double-Layer Transparent Conductive Oxide ITO/TNO Anti-Reflection Coating for Silicon Solar Cells

In this study, indium–tin oxide (ITO)/Nb-doping TiO2 (TNO) double-layer transparent conductive (TCO) films deposited using DC magnetron sputtering were used as a surface anti-reflection layer with an overall thickness of 100 nm for films. The simulated results showed that ITO and TNO combinations 90 nm/10 nm, 80 nm/20 70 nm/30 had higher transmittance lower reflectance than others in the visible wavelength range. Compared to single-layer films, ITO/TNO on glass silicon substrates optimum 80/20 was reduced by 5.06% 4.63%, respectively, at central 550 crystalline photo response 900 nm. Moreover, near-infrared when substrates, obviously improved graded refractive index lamination effect air (1)/ITO (1.98)/TNO (2.41)/Si (3.9).